| 1. | The polishing technology of ccos is studied by a series of experiments . the effect of polishing process parameters on the removal efficiency and the stability of the removal function are studied , which include the polishing compound , the density of the polishing fluid , ph of the polishing fluid , the polishing velocity , the polishing pressure and so on . finally , a suit of effective process parameters are given and better experimental result are obtain
在大量工艺实验的基础上,揭示了抛光剂种类、抛光液的供给量、抛光液浓度、抛光液的酸度值( ph值) 、抛光速度、抛光压力、抛光模材料、抛光模直径及胶层厚度等对抛光效率和去除函数稳定性的影响规律;最后,总结了一套抛光工艺,利用该工艺进行的抛光精度收敛性实验达到了较好的效果。 |
